Evolution of the bulk electric field in capacitively coupled argon plasmas at intermediate pressures

  • The physical characteristics of an argon discharge excited by a single-frequency harmonic waveform in the low-intermediate pressure regime (5–250 Pa) are investigated using particle-in-cell/Monte Carlo collisions simulations. It is found that, when the pressure is increased, a non-negligible bulk electric field develops due to the presence of a "passive bulk", where a plateau of constant electron density forms. As the pressure is increased, the ionization in the bulk region decreases (due to the shrinking of the energy relaxation length of electrons accelerated within the sheaths and at the sheath edges), while the excitation rate increases (due to the increase of the bulk electric field). Using the Fourier spectrum of the discharge current, the phase shift between the current and the driving voltage waveform is calculated, which shows that the plasma gets more resistive in this regime. The phase shift and the (wavelength-integrated) intensity of the optical emission from the plasma are also obtained experimentally. The good qualitative agreement of these data with the computed characteristics verifies the simulation model. Using the Boltzmann term analysis method, we find that the bulk electric field is an Ohmic field and that the peculiar shape of the plasma density profile is partially a consequence of the spatio-temporal distribution of the ambipolar electric field.

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Author:Máté VassORCiDGND, Sebastian WilczekORCiDGND, Aranka DerzsiORCiDGND, Benedek HorváthORCiDGND, Peter HartmannORCiDGND, Zóltán DonkóORCiDGND
Parent Title (English):Plasma sources science and technology
Publisher:IOP Publishing
Place of publication:Bristol, Vereinigtes Königreich
Document Type:Article
Date of Publication (online):2024/02/16
Date of first Publication:2022/04/25
Publishing Institution:Ruhr-Universität Bochum, Universitätsbibliothek
Tag:PIC/MCC simulations; capacitively coupled plasmas; intermediate pressure regime
Issue:4, Artikel 045017
First Page:045017-1
Last Page:045017-12
Institutes/Facilities:Lehrstuhl für Angewandte Elektrodynamik und Plasmatechnik
Dewey Decimal Classification:Technik, Medizin, angewandte Wissenschaften / Elektrotechnik, Elektronik
open_access (DINI-Set):open_access
faculties:Fakultät für Elektrotechnik und Informationstechnik
Licence (English):License LogoCreative Commons - CC BY 4.0 - Attribution 4.0 International