Lukas Mai, Felix Mitschker, Claudia Bock, Alessia Niesen, Engin Ciftyurek, Detlef Rogalla, Johannes Mickler, Matthias Erig, Zheshen Li, Peter Awakowicz, Klaus Schierbaum, Anjana Devi
- The identification of bis-3-(\(\it N,N\)-dimethylamino)propyl zinc ([Zn(DMP)\(_2\)], BDMPZ) as a safe and potential alternative to the highly pyrophoric diethyl zinc (DEZ) as atomic layer deposition (ALD) precursor for ZnO thin films is reported. Owing to the intramolecular stabilization, BDMPZ is a thermally stable, volatile, nonpyrophoric solid compound, however, it possesses a high reactivity due to the presence of Zn-C and Zn-N bonds in this complex. Employing this precursor, a new oxygen plasma enhanced (PE)ALD process in the deposition temperature range of 60 and 160 °C is developed. The resulting ZnO thin films are uniform, smooth, stoichiometric, and highly transparent. The deposition on polyethylene terephthalate (PET) at 60 °C results in dense and compact ZnO layers for a thickness as low as 7.5 nm with encouraging oxygen transmission rates (OTR) compared to the bare PET substrates. As a representative application of the ZnO layers, the gas sensing properties are investigated. A high response toward NO\(_2\) is observed without cross-sensitivities against NH\(_3\) and CO. Thus, the new PEALD process employing BDMPZ has the potential to be a safe substitute to the commonly used DEZ processes.
MetadatenAuthor: | Lukas MaiORCiDGND, Felix MitschkerORCiDGND, Claudia BockORCiDGND, Alessia NiesenGND, Engin CiftyurekORCiDGND, Detlef RogallaORCiDGND, Johannes MicklerGND, Matthias ErigGND, Zheshen LiORCiDGND, Peter AwakowiczORCiDGND, Klaus SchierbaumGND, Anjana DeviORCiDGND |
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URN: | urn:nbn:de:hbz:294-81376 |
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DOI: | https://doi.org/10.1002/smll.201907506 |
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Parent Title (English): | Small |
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Subtitle (English): | plasma-enhanced atomic layer deposition process engineering for zinc oxide layers from a non-pyrophoric zinc precursor for gas barrier and sensor applications |
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Publisher: | Wiley-VCH Verlag |
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Place of publication: | Weinheim |
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Document Type: | Article |
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Language: | English |
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Date of Publication (online): | 2021/06/09 |
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Date of first Publication: | 2020/04/28 |
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Publishing Institution: | Ruhr-Universität Bochum, Universitätsbibliothek |
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Tag: | Atomic layer deposition; Gas barrier layers; Gas sensors; Zinc oxide; Zinc precursors |
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Volume: | 16 |
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Issue: | 22,1907506 |
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First Page: | 1907506-1 |
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Last Page: | 1907506-12 |
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Note: | Dieser Beitrag ist auf Grund des DEAL-Wiley-Vertrages frei zugänglich. |
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Institutes/Facilities: | Lehrstuhl für Allgemeine Elektrotechnik und Plasmatechnik |
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| Lehrstuhl für Anorganische Chemie II, Inorganic Materials Chemistry |
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| RUBION - Zentrale Einrichtung für Ionenstrahlen und Radionuklide |
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Dewey Decimal Classification: | Naturwissenschaften und Mathematik / Chemie, Kristallographie, Mineralogie |
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open_access (DINI-Set): | open_access |
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faculties: | Fakultät für Chemie und Biochemie |
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Licence (English): | Creative Commons - CC BY 4.0 - Attribution 4.0 International |
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